Engineering Metastability in Atomic Layer Deposition: Polymorph and Valence Control
Jihoon Jeon, Seung Ho Ryu, Seungwan Ye, Gwang Min Park, Seong Keun Kim

TL;DR
This paper reviews how atomic layer deposition can be used to create metastable materials with unique properties by controlling their structure and chemical states.
Contribution
The paper introduces strategies for stabilizing metastable phases in ALD through polymorph and valence control.
Findings
Temperature modulation and substrate effects help stabilize metastable polymorphs.
Precursor design and post-deposition treatments enable valence state control in ALD.
These methods allow metastable phases to form despite low thermal budgets.
Abstract
Metastable phases characterized by their higher‐energy states offer promising functionalities for electronic, catalytic, and energy applications. However, their synthesis is often hindered by high formation energy barriers and thermodynamic constraints. Atomic layer deposition (ALD) has attracted significant interest for a wide range of applications, including semiconductors, advanced electronics, and energy‐related applications, owing to its exceptional features, including low‐temperature processing, precise atomic‐scale control, and excellent conformality. Despite these advantages, the inherently low thermal budget of ALD poses significant challenges for the synthesis of metastable phases. This review presents a comprehensive overview of the recent advances in the engineering of metastability via ALD. This review categorizes the manifestations of metastability in ALD into two main…
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Taxonomy
TopicsSemiconductor materials and devices · Electronic and Structural Properties of Oxides · Ferroelectric and Negative Capacitance Devices
