Design, Fabrication, and Characterization of Graphene-Silicon Nitride Integrated Mode Filters
Fernando Martín-Romero, Raquel Resta, Òscar Fontelles, Miguel Sinusia Lozano, Víctor J. Gómez
TL;DR
This paper presents a new type of optical filter using graphene and silicon nitride to reduce signal interference in high-speed communication systems.
Contribution
The paper introduces a novel fabrication method for graphene-silicon nitride mode filters with optimized design and performance.
Findings
The filter achieves a maximum contrast of 123 dB/cm between TE0 and TE1 modes at 1569 nm.
Minimum loss of −38 dB/cm is achieved for the TE1 mode.
The fabrication process includes a new etching approach to protect graphene nanoribbons.
Abstract
We present the design, fabrication, and characterization of broadband graphene-silicon nitride integrated mode filters working in the optical C-band, centered at a wavelength of 1.55 μm. The devices presented here prevent modal crosstalk, thus avoiding signal degradation in multimode communication systems. In particular, the fabricated filters are based on a dual-mode silicon nitride waveguide, partially covered by a centered graphene nanoribbon that induces a stronger absorption for the TE0 mode than for the TE1 mode. The geometry of the design has been optimized to minimize the length and insertion losses of the device. A complete fabrication process, including the transfer and lithography of commercial graphene, has been developed. A novel approach was introduced during the etching step, which entailed the simultaneous curing of the resist to encapsulate the graphene nanoribbons…
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Taxonomy
TopicsGraphene research and applications · Plasmonic and Surface Plasmon Research · Advanced Fiber Laser Technologies