# One Method for Improving Overlay Accuracy Through Focus Control

## TL;DR

This paper introduces a new method to improve the accuracy and efficiency of overlay measurements in semiconductor manufacturing using a combination of hardware and software techniques.

## Contribution

The novel approach integrates a dual-wavelength hardware design with a deep learning framework for real-time alignment and focus adjustment.

## Key findings

- A dual-wavelength, dual-detector hardware design minimizes interference between layers during imaging.
- A deep learning framework enables real-time adjustment of alignment and focus for improved overlay accuracy.
- The combined hardware-software strategy reduces background noise and system aberrations, enhancing measurement throughput.

## Abstract

Image-Based Overlay (IBO) equipment leverages optical reflection imaging principles, combined with focusing and alignment strategies to measure overlay marks. Among all measurement steps, the focal plane measurement of marks exerts the most critical impact on overlay accuracy, while the time consumed by focal plane detection directly determines the overall measurement throughput. To address the trade-off between accuracy and efficiency in advanced process nodes, this paper proposes an integrated optimization strategy encompassing optical hardware design and software algorithms. The hardware solution adopts a dual-wavelength, dual-detector architecture: optimal imaging wavelengths are selected independently for the previous-layer and current-layer marks, ensuring each layer achieves ideal imaging conditions without mutual interference. The software strategy employs a deep learning framework to simultaneously predict and adjust the horizontal position (alignment) and vertical defocus number of measured marks in real time with high precision, thereby securing the optimal imaging posture. By synergizing hardware-based optimal imaging conditions and software-based posture adjustment, this method effectively mitigates the impact of background noise and system aberrations, ultimately improving both the accuracy and efficiency of overlay measurement.