Effects of Annealing on the Radio Frequency Sputtered CuO/ZnO Thin Film Heterostructure for Optoelectronic Applications
Sinthamani Sivaprakasam, Sudhakar Bharatan, Ranjithkumar Mohanam, Sudharsanam Subramaniyam

TL;DR
Annealing improves the structural and optical properties of CuO/ZnO thin films, and adding MoS2 boosts photocurrent in optoelectronic devices.
Contribution
Demonstrates how annealing and MoS2 insertion enhance the performance of CuO/ZnO heterostructures for optoelectronic applications.
Findings
Annealed ZnO films showed a PL band-edge at 3.27 eV and increased grain size.
Annealed CuO films displayed direct band-to-band absorption at 2.89 eV with reduced defects.
The Al/FTO/MoS2/CuO/ZnO/Al heterostructure achieved 9 mA photocurrent under illumination.
Abstract
What are the main findings? ZnO and CuO thin films prepared by RF sputtering were optimized under varying annealing temperatures and ambient conditions, leading to improved structural quality.Annealed ZnO films showed increased grain size and strong sub-band absorption, with a PL band-edge at 3.27 eV.Annealed CuO films exhibited direct band-to-band absorption at 2.89 eV due to the disappearance of defect-related sub-bands.Raman spectroscopy and XRD analysis confirmed reduced defects and enhanced crystallinity in annealed CuO films.Al/FTO/MoS2/CuO/ZnO/Al heterostructure demonstrated improved photocurrents, achieving ~5 mA in the dark and ~9 mA under illumination. ZnO and CuO thin films prepared by RF sputtering were optimized under varying annealing temperatures and ambient conditions, leading to improved structural quality. Annealed ZnO films showed increased grain size and strong…
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Taxonomy
TopicsCopper-based nanomaterials and applications · ZnO doping and properties · Thin-Film Transistor Technologies
