# Magnetron sputtering of hybrid metal halide perovskites: barriers to scalable fabrication

## TL;DR

This study explores why RF magnetron sputtering is not widely used for making perovskite solar cells, identifying issues like poor film quality and target disintegration.

## Contribution

The paper identifies specific barriers to using RF sputtering for perovskite thin films, offering insights into process limitations and potential solutions.

## Key findings

- Sputtered perovskite films show rough surfaces and poor grain formation.
- Target disintegration during sputtering hinders scalable production.
- RF sputtering parameters significantly affect film quality and composition.

## Abstract

Radio frequency (RF) magnetron sputtering is a scalable, solvent-free, and industry-compatible deposition technique well-suited for roll-to-roll manufacturing. Despite its many advantages, this technique is not commonly used for the deposition of metal halide perovskites, which have emerged as one of the most promising photovoltaic materials. In this study, we systematically explore the barriers to depositing high-quality perovskite thin films from hybrid perovskite targets, which were prepared by pressing ball-milled dry perovskite powder. By investigating the influence of target stoichiometry, applied RF power, and Argon gas pressure on the structural, morphological, and compositional characteristics of the sputtered thin films, we identify key limitations to the application of magnetron sputtering to the fabrication of perovskite layers. Specifically, we reveal that the microstructure of these films exhibits a very rough surface and inadequate grain formation, limiting their use in subsequent optoelectronic applications. Additionally, target disintegration during sputtering poses a significant challenge, raising concerns about the feasibility of RF sputtering for roll-to-roll production of perovskite optoelectronic devices. Based on these insights, we discuss not only the limitations of the process but also potential paths to addressing these barriers.

This study examines RF magnetron sputtering of metal halide perovskites, highlighting key challenges – compositional and microstructural flaws and target disintegration – that limit its broad applicability for solar cell fabrication.