# Nanoscale Localization Microscopy and Deterministic Lithography of Solid-State Quantum Emitters

## TL;DR

This paper introduces a system that precisely maps and aligns quantum emitters with nanostructures to boost photon collection efficiency.

## Contribution

A programmable confocal microscope system for subwavelength localization and deterministic lithography of quantum emitters.

## Key findings

- Emitter positions can be localized within tens of nanometers despite sample drift.
- Photon intensity from emitters in micropillars was increased by up to 84% using this method.

## Abstract

Quantum emitters (QEs) in the solid state can be spatially
aligned
with nanostructures to increase the photon collection efficiency and
radiative emission rate. In many promising material platforms, these
QEs are randomly positioned over the sample area, necessitating precise
mapping of the emitter location and subsequent agile lithography aligned
with the source. We have developed a programmable confocal microscope
system to localize QEs with subwavelength precision, and subsequently
accurately define nanostructures around the emitters. We show that
repeated sampling of emitter location relative to alignment markers
can account for sample drift and localize the emitter position within
a few tens of nanometers. We demonstrate the deterministic enhancement
of the collected photon intensity by up to 84% for emitters embedded
in a micropillar.