Advancing nanolithography: a comprehensive review of materials for local anodic oxidation with AFM

TL;DR

This paper reviews materials used in local anodic oxidation with AFM for nanoscale patterning, highlighting semiconductors, metals, and 2D materials.

Contribution

The paper provides a comprehensive review of material advancements in local anodic oxidation for nanolithography.

Findings

Semiconductors like silicon and silicon carbide are foundational due to controllable oxidation kinetics.

2D materials such as graphene and transition metal dichalcogenides enable high-resolution nanoscale applications.

Electrode-free LAO expands material applicability and improves process precision and scalability.

Abstract

Local anodic oxidation (LAO), also known as local oxidation nanolithography or oxidation scanning probe lithography has emerged as a versatile technique for nanoscale patterning, leveraging the precision of scanning probe microscopy, relying specifically on atomic force microscopy. This review explores the materials utilized in LAO experiments, including semiconductors, metals, insulators, two-dimensional (2D) materials, and emerging heterostructures. Semiconductors such as silicon and silicon carbide remain foundational due to their controllable oxidation kinetics, while metals like titanium and aluminum offer opportunities for plasmonic and optical applications. 2D materials, including graphene, graphene oxide, and transition metal dichalcogenides, demonstrate unique oxidation behaviors, enabling high-resolution applications in electronics and quantum devices. Recent advancements, such as electrode-free LAO, have expanded the range of applicable materials and improved the precision and scalability of the process. This paper also aims to provide a comprehensive understanding of material selection in LAO and its implications for advancing nanotechnology.

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