# High-Uniformity Flat-Top Light Spot Based on a Dielectric Metasurface

## TL;DR

This paper introduces a compact dielectric metasurface that efficiently shapes laser beams into uniform flat-top spots, useful for laser processing and imaging.

## Contribution

A novel dielectric metasurface design using SiC nanopillars and SiO2 for high-uniformity flat-top beam shaping at 1064 nm.

## Key findings

- The metasurface produces a 2 μm radius flat-top spot with 0.1021 intensity uniformity.
- The design achieves 76.3% energy efficiency in beam shaping.
- The metasurface is compact and suitable for precision laser processing and bioimaging.

## Abstract

With the rapid development of laser processing and infrared imaging, the demand for flat-top beams with high uniformity has become increasingly urgent. Conventional beam-shaping techniques based on bonded aspheric lenses are inherently bulky and inflexible, which limits their compatibility with modern optical systems. In this work, we propose a dielectric metasurface for laser beam shaping operating at 1064 nm, where the target phase distribution is derived by the given initial phase and is represented by a hyperbolic phase. An inverse optimization algorithm is proposed to optimize the unit cell consisting of silicon carbide (SiC) nanopillars and the silicon dioxide (SiO2) substrate. Numerical results show that, after transmission through the designed metasurface, the beam forms a circular flat-top spot with a radius of 2 μm at the target plane, exhibiting an intensity uniformity of 0.1021 and an energy efficiency of 76.3%. This study offers a compact and highly efficient solution for the flat-top beam shaping, demonstrating significant potential for applications in precision-laser processing, optical trapping, and bioimaging.