# Engineered PN MoS2–Al2O3-Based Photodiode Device for High-Performance NIR LiDAR and Sensing Applications

## TL;DR

This paper introduces a new photodiode using a MoS2–Al2O3 composite layer that improves performance for near-infrared sensing and LiDAR applications.

## Contribution

The novel use of a co-sputtered MoS2–Al2O3 composite layer enhances NIR photoresponse and device performance.

## Key findings

- The device achieves a photocurrent of 10 mA with a response time of 155 µs under 100 mW·cm−2 illumination at 4 V.
- Peak responsivity is observed at 970 nm with sensitivity extending up to 1100 nm.
- Embedding Al2O3 improves the MoS2/Si interface and enhances vertical carrier collection.

## Abstract

Near-infrared (NIR) photodetectors are essential for LiDAR, optical communication, and sensing technologies requiring fast response and low power consumption. This work reports a PN photodiode incorporating a co-sputtered MoS2–Al2O3 composite layer to enhance NIR photoresponse for LiDAR and environmental sensing applications. The composite layer improves device performance through defect passivation, dielectric screening, and modified carrier transport behavior. Under 100 mW·cm−2 illumination at 4 V, the device delivers a photocurrent of 10 mA with a response time of 155 µs, corresponding to an approximately threefold (~300%) improvement compared to a reference structure. Spectral measurements show peak responsivity at 970 nm with extended sensitivity up to 1100 nm. These results indicate that embedding Al2O3 within the MoS2 improves the MoS2/Si interface and facilitates infrared photon absorption in the Si substrate, leading to enhanced vertical carrier collection and reduced recombination compared with conventional surface-passivated MoS2/dielectric layers-based devices. The proposed device demonstrates a low-cost, broadband photodiode architecture suitable for eye-safe LiDAR and environmental monitoring applications.