# Research on Stress Variations During the 4H-SiC Indentation Process

**Authors:** Wenshan Wang, Shuixing Lin, Yiqing Yu, Nian Duan

PMC · DOI: 10.3390/mi17010138 · 2026-01-22

## TL;DR

This study uses simulations and experiments to understand how stress affects 4H-SiC materials during indentation, revealing how pressure influences damage and stress distribution.

## Contribution

The paper introduces a validated SPH-based indentation model and mathematical stress characterization for 4H-SiC under varying pressures.

## Key findings

- Penetration depth of abrasive grains into 4H-SiC increases linearly with applied pressure.
- Stress-affected zones expand with higher pressure until cracks form, causing fluctuations.
- A clear stress distribution pattern emerges during indentation in 4H-SiC.

## Abstract

In order to explore the effect of stress on the damage of 4H-SiC materials, this paper employed single abrasive grain indentation simulation based on the Smoothed-Particle Hydrodynamics (SPH) method, and verified the accuracy of the indentation model through an indentation experiment on a single abrasive grain. The research examined the consequences of varying pressures on the processing of 4H-SiC, including parameters such as the depth of abrasive grain penetration, the stress-affected region, and the initiation and propagation of cracks. Subsequently, mathematical models were developed to characterize stress variations under different pressure conditions. The findings reveal several vital insights: First, a discernible linear relationship exists between the depth of abrasive grain penetration into 4H-SiC and the applied pressure. Second, within a specific pressure range, the stress-affected zone within the workpiece enlarges as the applied pressure increases. However, when cracks form within the workpiece, the dimensions of the stress-affected zone exhibit fluctuations. During the abrasive grain indentation phase, a discernible pattern emerges in the stress distribution within the workpiece.

## Full-text entities

- **Chemicals:** 4H-SiC (-)

## Figures

12 figures with captions in the complete paper: https://tomesphere.com/paper/PMC12844212/full.md

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Source: https://tomesphere.com/paper/PMC12844212