Cross Comparison Between Thermal Cycling and High Temperature Stress on I/O Connection Elements
Mamta Dhyani, Tsuriel Avraham, Joseph B. Bernstein, Emmanuel Bender

TL;DR
This paper compares how heat and temperature changes affect the reliability of FPGA I/O connections, revealing different degradation mechanisms.
Contribution
The study introduces a method to distinguish between on-die and package-level aging in FPGAs using resistance monitoring.
Findings
High-temperature dwell and thermal cycling both cause sub-linear resistance drift in FPGA I/O paths.
High-temperature stress has a lower activation energy (0.62 eV) compared to thermal cycling (1.3 eV).
Resistance monitoring can identify whether degradation is from on-die or package-level components.
Abstract
This work examines resistance drift in FPGA I/O paths subjected to combined electrical and thermal stress, using a Xilinx Spartan-6 device as a representative platform. A multiplexed measurement approach was employed, in which multiple I/O pins were externally shorted and sequentially activated, enabling precise tracking of voltage, current, and effective series resistance over time, under controlled bias conditions. Two accelerated stress modes were investigated: high-temperature dwell in the range of 80–120 °C and thermal cycling between 80 and 140 °C. Both stress modes exhibited similar sub-linear (power-law) time dependence on resistance change, indicating cumulative degradation behavior. However, Arrhenius analysis revealed a strong contrast in effective activation energy: approximately 0.62 eV for high-temperature dwell and approximately 1.3 eV for thermal cycling. This divergence…
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Taxonomy
TopicsElectronic Packaging and Soldering Technologies · Semiconductor materials and devices · Copper Interconnects and Reliability
