# A Comprehensive Kinetic Study on the Enhanced Thermal Stability of Silica Xerogels with the Addition of Organochlorinated Substituents

**Authors:** Beatriz Rosales-Reina, Guillermo Cruz-Quesada, Pablo Pujol, Santiago Reinoso, César Elosúa, Gurutze Arzamendi, María Victoria López-Ramón, Julián J. Garrido

PMC · DOI: 10.3390/gels12010002 · 2025-12-19

## TL;DR

This paper studies how adding organochlorinated compounds to silica xerogels improves their thermal stability and controls their decomposition behavior.

## Contribution

Quantitative kinetic analysis of thermal decomposition in organochlorinated xerogels using isoconversional methods and master plots.

## Key findings

- Aromatic chlorinated groups (like 4-chlorophenyl) provide higher thermal stability than aliphatic ones.
- Thermal decomposition occurs in two main stages with activation energies between 53 and 290 kJ mol−1.
- Increasing precursor content reduces surface area and pore volume but promotes periodic domain formation.

## Abstract

Hybrid silica xerogels functionalised with chlorinated organosilanes combine tunable porosity and surface chemistry, rendering them attractive for applications in sensing, membrane technology, and photonics. This study quantitatively investigates the thermal decomposition kinetics of organochlorinated xerogels and correlates with volatile compounds previously identified via Thermogravimetric Analysis (TGA) coupled to Fourier-Transform Infrared Spectroscopy (FT–IR) and Gas Chromatography coupled with Mass Spectrometry (GC–MS). The xerogels were synthesised via the sol–gel process using organochlorinated alkoxysilane precursors and yielded highly condensed nanostructures in which the precursor nature strongly influences the morphology and textural properties. In this study, the molar percentage of the organochlorinated compounds was fixed at 10%. Standard N2 adsorption-desorption isotherm at 77 K revealed that increasing the precursor content systematically decreased the specific surface area and pore volume of the materials while promoting the formation of periodic domains, which are observed even at low organosilane molar percentages. Thermal characterisation via TGA/FT–IR/GC–MS revealed at least two main decomposition stages, with thermal stability following the order of 4–chlorophenyl > chloromethyl > 3–chloropropyl > 2–chloroethyl. This study focuses on kinetic and mechanistic insights in the thermal decomposition process through the Flynn–Wall–Ozawa isoconversional method and Criado master plots, using TGA/Differential Scanning Calorimetry (DSC) measurements under nitrogen at multiple heating rates (5, 10, 20, 30, and 40 K min−1), which revealed activation energies ranging from 53 to 290 kJ mol−1. Demonstrating that the chlorinated organosilane precursor directly controls both the textural properties and thermal behaviour of the resulting silica materials, with aromatic groups providing superior thermal stability compared to aliphatic chains. These quantitative kinetic insights provide a predictive framework for designing thermally stable hybrid materials while ensuring safe processing conditions to prevent hazardous volatile release.

## Linked entities

- **Chemicals:** 4-chlorophenyl (PubChem CID 5376741), chloromethyl (PubChem CID 5378701)

## Full-text entities

- **Chemicals:** N2 (MESH:D009584), silica (MESH:D012822), 2-chloroethyl (-), organosilane (MESH:D017646)

## Figures

8 figures with captions in the complete paper: https://tomesphere.com/paper/PMC12840895/full.md

---
Source: https://tomesphere.com/paper/PMC12840895