Scalable Manufacturing and Precise Patterning of Perovskites for Light-Emitting Diodes

TL;DR

This review explores methods to manufacture and pattern perovskite light-emitting diodes for high-quality displays, addressing challenges like scalability and stability.

Contribution

The paper systematically analyzes scalable manufacturing and precise patterning strategies for perovskite light-emitting diodes.

Findings

Top-down and bottom-up fabrication methods are evaluated for patterning PeLEDs.

Challenges include device stability and uniform large-area film formation.

Promising strategies for commercialization include inkjet printing and laser lithography.

Abstract

This review provides a comprehensive exploration of advanced film and patterning fabrication techniques for high-performance perovskite light-emitting diodes (PeLEDs).
This review examines both top-down and bottom-up techniques, such as photolithography and inkjet printing to achieve precise patterning of PeLEDs for full-color displays.
This review discusses critical challenges, including device stability, scalable manufacturing, and microscale pixel patterning, as well as promising strategies to overcome these obstacles for the commercialization of PeLEDs.

This review provides a comprehensive exploration of advanced film and patterning fabrication techniques for high-performance perovskite light-emitting diodes (PeLEDs).

This review examines both top-down and bottom-up techniques, such as photolithography and inkjet printing to achieve precise patterning of PeLEDs for full-color displays.

This review discusses critical challenges, including device stability, scalable manufacturing, and microscale pixel patterning, as well as promising strategies to overcome these obstacles for the commercialization of PeLEDs.

Owing to the exceptional optoelectronic properties, metal halide perovskites have emerged as leading semiconductor materials for next-generation display technologies, providing perovskite light-emitting diodes (PeLEDs) great potential for high-quality color displays with a wide color gamut and pure color emission. Although laboratory-scale PeLEDs have achieved near-theoretical efficiencies, challenges such as achieving uniform large-area films, improving material stability, and enhancing patterning precision remain barriers to commercialization. This review presents a systematic analysis of scalable manufacturing and precision patterning strategies for PeLEDs, focusing on their applications in large-area lighting and full-color displays. Fabrication methods are categorized into film deposition techniques (spin-coating, blade-coating, and thermal evaporation) and patterning strategies, including top-down (photolithography, laser/e-beam lithography, and nanoimprinting) and bottom-up (patterned crystal growth, inkjet printing, and electrohydrodynamic jet printing) approaches. In this review, we discuss the advantages and limitations of each strategy, highlight current challenges, and outlook possible pathways towards scalable, high-performance PeLEDs for advanced optoelectronic applications.

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