# Scalable Graphene–MoS2 Lateral Contacts for High-Performance 2D Electronics

**Authors:** Woonggi Hong

PMC · DOI: 10.3390/ma18204689 · Materials · 2025-10-13

## TL;DR

This paper introduces a new method using graphene-MoS2 lateral contacts to improve the performance of 2D electronic devices.

## Contribution

A scalable fabrication method for graphene–MoS2 lateral heterostructures is demonstrated, significantly reducing contact resistance and improving device performance.

## Key findings

- Gr–MoS2 FETs show a threefold increase in average field-effect mobility compared to conventional MoS2 FETs.
- Contact resistance is reduced from 85.8 kΩ to 20.5 kΩ at VG = 40 V using graphene–metal contacts.
- The method avoids transfer steps by using edge-guided CVD to grow MoS2 along graphene edges.

## Abstract

As the scaling of silicon-based CMOS technology approaches its physical limits, two-dimensional (2D) materials have emerged as promising alternatives for future electronic devices. Among them, MoS2 is a leading candidate due to its fascinating semiconducting nature and compatibility with CMOS processes. However, high contact resistance at the metal–MoS2 interface remains a major bottleneck, limiting device performance. In this study, we report the fabrication and characterization of graphene–MoS2 (Gr–MoS2) lateral heterostructure FETs, where monolayer graphene, synthesized by inductively coupled plasma chemical vapor deposition (ICP-CVD), is directly used as the source and drain. Bilayer MoS2 is selectively grown along graphene edges via edge-guided CVD, forming a chemically bonded in-plane junction without transfer steps. Electrical measurements reveal that the Gr–MoS2 FETs exhibit a threefold increase in average field-effect mobility (3.9 vs. 1.1 cm2 V−1 s−1) compared to conventional MoS2 FETs. Y-function analysis shows that the contact resistance is significantly reduced from 85.8 kΩ to 20.5 kΩ at VG = 40 V. These improvements are attributed to the replacement of the conventional metal–MoS2 contact with a graphene–metal contact. Our results demonstrate that lateral heterostructure engineering with graphene provides an effective and scalable strategy for high-performance 2D electronics.

## Full-text entities

- **Chemicals:** metal (MESH:D008670), MoS2 (MESH:C082964), Graphene (MESH:D006108), silicon (MESH:D012825)

## Full text

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## Figures

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## References

43 references — full list in the complete paper: https://tomesphere.com/paper/PMC12566082/full.md

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Source: https://tomesphere.com/paper/PMC12566082