# Flexible Memory Application of Nanoscale Ti–Ge–Te Thin Film as Information Storage Medium With Excellent Thermal Stability, Low Resistance Drift and Superior Bending Characteristic

**Authors:** Han Gu, Weihua Wu, Xiaochen Zhou, Pei Zhang, Bowen Fu, Jiwei Zhai, Sannian Song, Zhitang Song

PMC · DOI: 10.1002/advs.202507859 · Advanced Science · 2025-08-04

## TL;DR

Researchers developed a flexible nanoscale Ti–Ge–Te thin film with excellent thermal stability and bending resistance, suitable for wearable electronics.

## Contribution

A Ti-doped GeTe thin film is introduced with enhanced thermal stability, low resistance drift, and superior bending performance for flexible memory devices.

## Key findings

- Ti doping hinders crystallization and grain growth in GeTe thin films.
- Ti–Ge–Te films retain structural and electrical properties after 10⁶ bending cycles.
- DFT calculations show Ti doping converts GeTe's bandgap to direct and strengthens Ti–Te covalent bonding.

## Abstract

The flexible Ti–Ge–Te phase change material was proposed and fabricated by magnetron cosputtering method. The impact of titanium dopant and mechanical bending on the thermal stability, electrical resistance, surface morphology, microstructure, and crystallization mechanism of GeTe thin film are investigated systematically. With the incorporation of appropriate titanium dopant, the crystallization process and grain size of GeTe material can be hindered. Meanwhile, the thermal stability, surface morphology, and crystal structure have not been changed obviously when the bending times reaching 106, demonstrating the distinguished mechanical bending performance. The phase change memory devices with Ti‐doped GeTe were prepared based on flexible polyimide substrates, and the electronical properties are evaluated. The consequences show that the phase change memory can still exhibit the negative resistance phenomenon and complete the erase/write operation after bending 106 cycles. The density functional theory calculations of band structure illustrate that titanium dopant can convert the indirect band gap of GeTe material to the direct type. The formation energy and charge density difference indicate the massive electron cloud agglomerate between the Ti and Te atoms, deducing that the foreign Ti may occupy the position of Ge and form the covalent bonds with Te.

Nanoscale Ti–Ge–Te films were fabricated via magnetron co‐sputtering, exhibiting the exceptional thermal stability, low resistance drift, and superior mechanical flexibility. Density functional theory reveals Ti doping can convert GeTe to a direct bandgap semiconductor and enhance covalent Ti–Te bonding. Flexible phase‐change memory devices demonstrate the reliable switching at electrical pulse with 5 ns, showcasing the potential for wearable electronics applications.

## Linked entities

- **Chemicals:** Ti (PubChem CID 23963), Te (PubChem CID 5460633), Ge (PubChem CID 6326954)

## Full-text entities

- **Chemicals:** GeTe (-), Ge (MESH:D005857), Te (MESH:D013691), Ti (MESH:D014025)

## Full text

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## Figures

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## References

60 references — full list in the complete paper: https://tomesphere.com/paper/PMC12561333/full.md

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Source: https://tomesphere.com/paper/PMC12561333