High-quality polycrystalline vanadium dioxide thin films deposited via pulsed laser deposition with high uniformity and consistency

TL;DR

This paper presents a new method for creating high-quality vanadium dioxide thin films with consistent properties and uniform thickness.

Contribution

An optimized pulsed laser deposition method for high-uniformity and reproducible vanadium dioxide thin films is introduced.

Findings

The films show a resistance change of over four orders of magnitude during phase transition.

Thickness variation across a 100 mm wafer is less than 2%, indicating high uniformity.

The method demonstrates reliable reproducibility over time.

Abstract

Vanadium dioxide (VO2) is a phase transition material that experiences significant shifts in electrical, optical, and mechanical properties near its transition temperature. Among various methods for depositing VO2 thin films, pulsed laser deposition (PLD) provides precise stoichiometric control, good versatility, and high consistency. In this work, we introduce an optimized PLD-based method for depositing high-quality polycrystalline VO2 thin films. Experimental results demonstrate a resistance change of over four orders of magnitude during the phase transition, accompanied by high uniformity, with a thickness variation of less than 2% across a 100 mm wafer, and reliable reproducibility over time.

The online version contains supplementary material available at 10.1007/s10854-025-15921-6.

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