# Selective Gelation Patterning of Solution-Processed Indium Zinc Oxide Films via Photochemical Treatments

**Authors:** Seullee Lee, Taehui Kim, Ye-Won Lee, Sooyoung Bae, Seungbeen Kim, Min Woo Oh, Doojae Park, Youngjun Yun, Dongwook Kim, Jin-Hyuk Bae, Jaehoon Park

PMC · DOI: 10.3390/nano15151147 · Nanomaterials · 2025-07-24

## TL;DR

This paper introduces eco-friendly methods to pattern indium zinc oxide films for electronic devices without using traditional chemicals.

## Contribution

A novel photochemical and plasma-based patterning method for IZO films is proposed and compared.

## Key findings

- UV-ozone treatment produced the most uniform and well-defined IZO patterns.
- Devices made with UV-ozone-patterned IZO showed the best electrical performance.
- All methods enabled functional transistors without photolithography or chemical developers.

## Abstract

This study presents a photoresist-free patterning method for solution-processed indium zinc oxide (IZO) thin films using two photochemical exposure techniques, namely pulsed ultraviolet (UV) light and UV-ozone, and a plasma-based method using oxygen (O2) plasma. Pulsed UV light delivers short, high-intensity flashes of light that induce localised photochemical reactions with minimal thermal damage, whereas UV-ozone enables smooth and uniform surface oxidation through continuous low-pressure UV irradiation combined with in situ ozone generation. By contrast, O2 plasma generates ionised oxygen species via radio frequency (RF) discharge, allowing rapid surface activation, although surface damage may occur because of energetic ion bombardment. All three approaches enabled pattern formation without the use of conventional photolithography or chemical developers, and the UV-ozone method produced the most uniform and clearly defined patterns. The patterned IZO films were applied as active layers in bottom-gate top-contact thin-film transistors, all of which exhibited functional operation, with the UV-ozone-patterned devices exhibiting the most favourable electrical performance. This comparative study demonstrates the potential of photochemical and plasma-assisted approaches as eco-friendly and scalable strategies for next-generation IZO patterning in electronic device applications.

## Linked entities

- **Chemicals:** ozone (PubChem CID 24823)

## Full-text entities

- **Chemicals:** IZO (-), O2 (MESH:D010100), ozone (MESH:D010126)

## Full text

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## Figures

9 figures with captions in the complete paper: https://tomesphere.com/paper/PMC12348702/full.md

## References

22 references — full list in the complete paper: https://tomesphere.com/paper/PMC12348702/full.md

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Source: https://tomesphere.com/paper/PMC12348702