A Strain-Compensated InGaAs/InGaSb Type-II Superlattice Grown on InAs Substrates for Long-Wavelength Infrared Photodetectors
Hao Zhou, Chang Liu, Yiqiao Chen

TL;DR
Researchers created a new type of infrared detector using a strain-compensated superlattice material, achieving high performance for long-wavelength infrared detection.
Contribution
The first demonstration of a highly strained InGaAs/InGaSb superlattice on InAs substrates for long-wavelength infrared detection.
Findings
The superlattice structure achieved a 50% cutoff wavelength of approximately 12.1 μm at 77 K.
Devices showed a dark current density of 7.96 × 10−2 A/cm2 and a peak responsivity of 4.90 A/W at 77 K.
A peak quantum efficiency of 65% and specific detectivity of 2.74 × 1010 cm·Hz1/2/W were achieved.
Abstract
In this paper, the first demonstration of a highly strained In0.8Ga0.2As/In0.2Ga0.8Sb type-II superlattice structure grown on InAs substrates by molecular beam epitaxy (MBE) for long-wavelength infrared detection was reported. Novel methodologies were developed to optimize the As and Sb flux growth conditions. The quality of the epitaxial layer was characterized using multiple analytical techniques, including differential interference contrast microscopy, atomic force microscopy, high-resolution X-ray diffraction, and high-resolution transmission electron microscopy. The high-quality superlattice structure, with a total thickness of 1.5 μm, exhibited exceptional surface morphology with a root-mean-square roughness of 0.141 nm over a 5 × 5 μm2 area. Single-element devices with PIN architecture were fabricated and characterized. At 77 K, these devices demonstrated a 50% cutoff wavelength…
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Taxonomy
TopicsAdvanced Semiconductor Detectors and Materials · Semiconductor Quantum Structures and Devices · Chalcogenide Semiconductor Thin Films
