MBE Growth of High-Quality HgCdSe for Infrared Detector Applications
Zekai Zhang, Wenwu Pan, Gilberto A. Umana Membreno, Shuo Ma, Lorenzo Faraone, Wen Lei

TL;DR
This paper explores the growth of high-quality HgCdSe using molecular beam epitaxy for infrared detectors, showing promising results despite some performance limitations.
Contribution
The study demonstrates the first prototype HgCdSe-based mid-wave infrared detectors with optimized MBE growth parameters.
Findings
High-quality HgCdSe achieved with an XRD FWHM of ~65 arcsec.
Mid-wave infrared photoconductor showed a cut-off wavelength of 4.2 µm and peak detectivity of ~1.2 × 109 cmHz1/2/W.
Detector performance is lower than HgCdTe due to high background electron concentration.
Abstract
HgCdSe has recently been proposed as a potential alternative material to HgCdTe for fabricating high-performance infrared detectors. This work presents a study on the growth of high-crystalline-quality HgCdSe materials on GaSb (211)B substrates via molecular beam epitaxy and demonstration of the first prototype HgCdSe-based mid-wave infrared detectors. By optimizing the MBE growth parameters, and especially the thermal cleaning process of the GaSb substrate surface prior to epitaxial growth, high-quality HgCdSe material was achieved with a record XRD full width at half maximum of ~65 arcsec. At a temperature of 77 K, the mid-wave infrared HgCdSe n-type material demonstrated a minority carrier lifetime of ~1.19 µs, background electron concentration of ~2.2 × 1017 cm−3, and electron mobility of ~1.6 × 104 cm2/Vs. The fabricated mid-wave infrared HgCdSe photoconductor presented a cut-off…
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Taxonomy
TopicsAdvanced Semiconductor Detectors and Materials · Chalcogenide Semiconductor Thin Films · Semiconductor Quantum Structures and Devices
