# Design and fabrication of 4 double input NAND gate chip with excellent electrical and physical performances

**Authors:** Lijun Zhang, Wenqiang Dang, Yu Lu, Yongshun Wang

PMC · DOI: 10.1038/s41598-025-14874-4 · Scientific Reports · 2025-08-11

## TL;DR

This paper presents a new 4-input NAND gate chip designed for aerospace and harsh environments with improved electrical and physical performance.

## Contribution

A novel 4-input NAND gate chip was designed and fabricated using a 1.2 μm CMOS process with enhanced ESD protection and anti-locking capabilities.

## Key findings

- The chip was fabricated using 1.2 μm P-well SPDM CMOS technology for improved performance.
- An ESD protection circuit was added to prevent input terminal damage from electrostatic discharge.
- The device's performance exceeds that of similar products globally.

## Abstract

In order to improve the performances of 4 two-input NAND so that it can be better used in the aerospace application field and in harsh environments, 4 two-input NAND gate chips were designed and successfully fabricated in this paper, based on 1.2 \documentclass[12pt]{minimal}
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				\begin{document}$$V_{CC}$$\end{document}, to increase its anti-locking capability. An ESD protection circuit was designed at the input terminals, prohibiting the terminal of IC chip from being damaged by ESD stress. The performance of the device is superior to that of other similar products in the world.

## Full-text entities

- **Chemicals:** Al (MESH:D000535), metal (MESH:D008670), oxide (MESH:D010087), ammonia (MESH:D000641), silicon (MESH:D012825), PMOS (-)

## Full text

_Full body text omitted from this summary view._ Fetch the complete paper as Markdown: https://tomesphere.com/paper/PMC12340108/full.md

## Figures

13 figures with captions in the complete paper: https://tomesphere.com/paper/PMC12340108/full.md

## References

5 references — full list in the complete paper: https://tomesphere.com/paper/PMC12340108/full.md

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Source: https://tomesphere.com/paper/PMC12340108