# Silicon and Silver Low-Energy Ion Implantation into Titanium Plates for Improved Biocompatibility

## TL;DR

This paper explores using silicon and silver ion implantation on titanium to improve implant biocompatibility and antibacterial properties.

## Contribution

A novel low-energy ion implantation method combining silver and silicon on titanium surfaces is introduced.

## Key findings

- Titanium plates implanted with Ag and Si showed increased surface roughness and hydrophilicity.
- Electrochemical tests confirmed surface reactivity and stability over 28 days.
- The method demonstrated potential for improved osseointegration and antibacterial properties.

## Abstract

Surface modification of implant materials continues to
address
the issue of osseointegration. Moreover, combining osseointegration
with bactericidal or antifouling properties in implants remains an
open question for debate. Over the years, silver has been widely used
as an agent for killing and preventing bacterial proliferation. Silicon,
on the other hand, has been linked to improved osteogenic activity.
In this work, titanium plates were incorporated with both Ag and Si
ions through low-energy ion implantation, and surface characterization
was carried out to validate the process. Ti plates containing 43 μg
cm–2 Ag were further enriched with small amounts
of Si, as verified by glow discharge optical emission spectroscopy
(GD-OES) and energy-dispersive X-ray spectroscopy (EDS). This added
step increased surface roughness by approximately 11% and led to a
statistically significant difference in wettability, rendering hydrophilic
features (from angles around 90° to below 70° for the Ag
+ Si condition)both of which influence biocompatibility. Electrochemical
tests showed a more reactive surface for implanted samples but nonetheless
demonstrated stability over 28 days. Further research should focus
on increasing the Si doping in Ti and evaluating subsequent in vitro conditions.