The Effect of Substrate Surface Oxidation on Patterned Graphene Growth for Flexible Electronics

TL;DR

This paper shows how substrate surface oxidation can be used to precisely create patterned graphene for flexible electronics, enabling the fabrication of high-precision devices.

Contribution

A novel method for high-precision in situ fabrication of patterned graphene using substrate surface oxidation.

Findings

Patterned graphene with a feature size of 0.5 μm was achieved using substrate surface oxidation.

The boundary precision between oxidized and unoxidized regions was effectively controlled by regulating oxidation time.

A flexible fluorescent device demonstrated graphene's strong fluorescence quenching effect (IGr-free/IGr-cov ≈ 3).

Abstract

Graphene exhibits exceptional electronic properties, superior mechanical strength, and remarkable flexibility, driving significant advances in flexible electronics. However, achieving high-precision patterned graphene via in situ fabrication for such applications remains challenging, limiting the development of graphene-based flexible devices. In this study, we successfully synthesized patterned graphene with high precision by substrate surface oxidation technology. The effect of substrate surface oxidation on patterned graphene growth was deeply investigated. By regulating the oxidation time, we precisely controlled the oxidation degree of the substrate and characterized the boundary precision between oxidized and unoxidized regions. Finally, we achieved the high-precision in situ fabrication of patterned graphene with a feature size of 0.5 μm on selectively oxidized substrates. Furthermore, we fabricated a flexible fluorescent device based on patterned graphene, demonstrating the pronounced fluorescence quenching effect of graphene (IGr-free/IGr-cov ≈ 3).

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