Multi-Bit Resistive Random-Access Memory Based on Two-Dimensional MoO3 Layers
Kai Liu, Wengui Jiang, Liang Zhou, Yinkang Zhou, Minghui Hu, Yuchen Geng, Yiyuan Zhang, Yi Qiao, Rongming Wang, Yinghui Sun

TL;DR
This paper presents a 2D material-based RRAM device with improved performance and multi-bit storage for advanced memory applications.
Contribution
A novel Pd-MoO3-Ag RRAM device with multi-bit storage and improved retention using 2D materials is developed.
Findings
The Pd-MoO3-Ag RRAM device achieved low write voltage (~0.5 V) and high switching ratio (>106).
The Gr-MoO3-Ag heterostructure improved retention time by fivefold (>104 s).
2D materials enable high On/Off ratios and long-term data retention in RRAM devices.
Abstract
Two-dimensional (2D) material-based resistive random-access memory (RRAM) has emerged as a promising solution for neuromorphic computing and computing-in-memory architectures. Compared to conventional metal-oxide-based RRAM, the novel 2D material-based RRAM devices demonstrate lower power consumption, higher integration density, and reduced performance variability, benefiting from their atomic-scale thickness and ultra-flat surfaces. Remarkably, 2D layered metal oxides retain these advantages while preserving the merits of traditional metal oxides, including their low cost and high environmental stability. Through a multi-step dry transfer process, we fabricated a Pd-MoO3-Ag RRAM device featuring 2D α-MoO3 as the resistive switching layer, with Pd and Ag serving as inert and active electrodes, respectively. Resistive switching tests revealed an excellent operational stability, low write…
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Taxonomy
TopicsAdvanced Memory and Neural Computing · Transition Metal Oxide Nanomaterials · Ferroelectric and Negative Capacitance Devices
