Real-time monitoring of photodegradation in photoresists using a quartz crystal microbalance
Zhun Gu, Kaitong Yang, Hayford Boamah, Dong Chen, Zhiqiang Zhu, Jie Wang
TL;DR
This paper introduces a new method using a quartz crystal microbalance to monitor photoresist degradation in real time.
Contribution
A novel integration of laser irradiation and QCM sensing for real-time photodegradation evaluation in photoresists.
Findings
The method correlates with traditional photoresist evaluation techniques.
Viscoelastic transitions and shear stress evolution during photoreactions were observed.
Contrast, shear force, and viscoelasticity values for AZ1518 were successfully measured.
Abstract
We report a quantitative method for the real-time evaluation of photoresist performance that integrates laser irradiation with quartz crystal microbalance (QCM) sensing technology. The results obtained for the model photoresist AZ1518 correlated with the traditionally obtained ones. Furthermore, the system revealed viscoelastic transitions and shear stress evolution during photoreactions. By combining a laser and a QCM sensor, this study presents a convenient method for evaluating the photodegradation of the photoresist AZ1518. Moreover, the contrast, shear force and viscoelasticity values for AZ1518 were obtained.
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Taxonomy
TopicsAnalytical Chemistry and Sensors · Acoustic Wave Resonator Technologies · Photoacoustic and Ultrasonic Imaging