# 50 eV O+ ion induced deposition of tin dioxide using tetramethyltin

## TL;DR

This study shows how low-energy ion beams can create tin dioxide films using tetramethyltin and oxygen ions at room temperature.

## Contribution

A novel method for depositing tin dioxide films using 50 eV O+ ions and tetramethyltin at ambient temperature.

## Key findings

- Exposure to 50 eV O+ ions and tetramethyltin produced 30 nm thick tin dioxide films.
- XPS and X-ray diffraction confirmed the composition of the deposited films as tin dioxide.
- Using Sn+ ions with oxygen produced metallic tin films, not tin dioxide.

## Abstract

The aim of the present study was to deposit tin oxide films on Si wafers or quartz crystal microbalance plates acting as substrates, using low-energy ion beams. The substrates were held at ambient temperature and two different methods were employed. In one case, the substrates were exposed to a 100 eV beam of Sn+ ions together with a flow of gaseous oxygen, and these conditions were found to generate films. Analyses by X-ray photoelectron spectroscopy (XPS) confirmed that these films were made of metallic tin. In other trials, the substrates were exposed to tetramethyltin in conjunction with a 50 eV O+ ion beam. This procedure deposited films with a thickness of 30 nm and assessments by XPS and X-ray diffraction established that these films were made of tin dioxide.

•Low-energy ion beam deposition is a powerful technique for the film formation.•Tin oxide film has attracted much attention because of its various practical applications.•We used tetramethyltin (TMT) as a source material for tin oxide film formation.•Tin dioxide films were formed when 50 eV O+ ions were injected in conjunction with TMT.

Low-energy ion beam deposition is a powerful technique for the film formation.

Tin oxide film has attracted much attention because of its various practical applications.

We used tetramethyltin (TMT) as a source material for tin oxide film formation.

Tin dioxide films were formed when 50 eV O+ ions were injected in conjunction with TMT.