# Direct Growth of Low Thermal Conductivity WTe2 Nanocrystalline Films on W Films

**Authors:** Zhisong Yu, Rong Tao, Jin Guo, Shiyi Feng, Yue Wang

PMC · DOI: 10.3390/nano14050401 · Nanomaterials · 2024-02-22

## TL;DR

This paper describes a method to grow high-quality WTe2 nanocrystalline films with improved thermal properties.

## Contribution

A novel approach combining magnetron sputtering and chemical vapor deposition to produce WTe2 films with low thermal conductivity.

## Key findings

- WTe2 nanocrystalline films were successfully prepared on quartz substrates using magnetron sputtering and chemical vapor deposition.
- Optimal conditions (600°C for 30 min) produced films with good crystallinity and a thermal conductivity of 1.173 Wm−1K−1 at 300 K.

## Abstract

WTe2 has attracted much attention because of its layered structure and special electronic energy band structure. However, due to the difficulty of evaporating the W element itself and the inactivity of the Te element, the obtained large-area WTe2 thin films are usually accompanied by many defects. In this paper, WTe2 nanocrystalline films were successfully prepared on quartz substrates using magnetron sputtering and chemical vapor deposition techniques. Various analytical techniques such as X-ray Diffraction, Raman spectra, X-ray Photoelectron Spectroscopy, Scanning Electron Microscope, and photoluminescence spectra are employed to analyze the crystal structure, composition, and morphology. The effects of different tellurization temperatures and tellurization times on the properties of WTe2 thin films were investigated. WTe2 nanocrystalline films with good crystallinity were obtained at 600 °C for 30 min. The thermal conductivity of the WTe2 films prepared under this condition was 1.173 Wm−1K−1 at 300 K, which is significantly higher than that of samples prepared using other methods.

## Full text

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## Figures

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## References

33 references — full list in the complete paper: https://tomesphere.com/paper/PMC10934355/full.md

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Source: https://tomesphere.com/paper/PMC10934355