Dispersion-Engineered Terahertz Silicon Interconnects Enabling Terabit-Scale Data Links
Bodhan Chakraborty, Wenhao Wang, Nikhil Navaratna, Thomas Caiwei Tan, Pascal Szriftgiser, Hadjer Nihel Khelil, Guillaume Ducournau, Ranjan Singh

TL;DR
This paper demonstrates a CMOS-compatible, multi-band terahertz silicon interconnect achieving over 1 Tbps data transfer, enabling scalable, energy-efficient high-density on-chip communication for AI and 6G applications.
Contribution
It introduces a dispersion-engineered silicon waveguide platform supporting multi-band, dual-polarization THz data links with low loss and dispersion, achieving terabit-per-second throughput.
Findings
Achieved 1.004 Tbps aggregate data rate with 14 channels in a straight waveguide.
Supported operation from 220 to 500 GHz with low GVD of 0.15 ps²/mm.
Demonstrated low-loss, low-dispersion waveguides in both straight and bent configurations.
Abstract
The rapid growth of artificial intelligence (AI) and data-centric computing is driving exabyte-scale data transfer, pushing conventional interconnect technologies toward fundamental bandwidth and energy limits. Although optical interconnects provide high-capacity and long-reach communication, their complexity and energy overhead limit scalability in short-reach chiplet-based and on-chip systems. Terahertz (THz) silicon interconnects offer a promising alternative by bridging electronics and photonics in compact, complementary metal-oxide-semiconductor (CMOS)-compatible platforms capable of high bandwidth and low latency. However, practical THz interconnects require simultaneous multi-band operation, dual-polarization support, low propagation loss, low group-velocity dispersion (GVD), and terabit-per-second throughput, while avoiding Bragg-induced stopbands and dispersion penalties at…
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