Local droplet etching-assisted quantum dot epitaxy for telecom C-band quantum light emitters
Karolina E. Po{\l}czy\'nska, Pawe{\l} Wyborski, Micha{\l} Gawe{\l}czyk, Shima Kadkhodazadeh, Battulga Munkhbat, Stefano Sanguinetti, Elizaveta Semenova

TL;DR
This paper introduces a novel method using local droplet etching to fabricate telecom-wavelength quantum dots with high optical quality and single-photon emission capabilities for quantum communication.
Contribution
It demonstrates a reproducible, symmetric quantum dot fabrication technique with detailed structural and optical characterization, advancing scalable quantum light source development.
Findings
Quantum dots exhibit narrow emission lines (0.2 meV).
Single-photon emission confirmed with low $g^{(2)}(0)$ values.
QDs maintain emission up to liquid-nitrogen temperatures.
Abstract
Significant progress in quantum light sources for quantum communication applications requires reproducible and symmetric quantum emitters acting as single-photon sources capable of generating entangled photons on demand at specific telecom wavelengths. Here, we propose telecom-emitting epitaxial quantum dots (QDs) fabricated using the local droplet etching (LDE) approach. The resulting well-defined, low-density (/cm) QDs based on InGaAs are formed in symmetric LDE nanoholes (in-plane aspect ratio of 1.14) in InAlAs. Detailed transmission electron microscopy provides comprehensive insight into the structural integrity, interface quality, and compositional profiles of the QDs, which underpin their promising optical properties. Photoluminescence spectroscopy reveals narrow emission lines (0.2 meV) and high optical quality, while second-order…
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