Geometric Percolation Threshold Defines Half-Metallic Window in Vacancy-Doped Titanium disulfides
Shrestha Dutta, Rudra Banerjee

TL;DR
This paper demonstrates that the transition to half-metallicity in vacancy-doped monolayer TiS2 is governed by a geometric percolation threshold, establishing a universal framework for defect-induced magnetism in 2D materials.
Contribution
It introduces a percolation-based model to explain the insulator-to-half-metal transition in vacancy-doped 2D TiS2, linking geometric connectivity to magnetic and electronic properties.
Findings
Percolation threshold at approximately 12.5% vacancy concentration triggers half-metallicity.
Spanning cluster formation is essential for spin-polarized transport.
Estimated Curie temperature exceeds 300 K, indicating potential for room-temperature applications.
Abstract
Defect engineering of two-dimensional materials routinely produces local magnetic moments, yet itinerant half-metallic ferromagnetism remains elusive -- experiments frequently yield paramagnetic insulators. We resolve this paradox for vacancy-doped monolayer -\ptis~by demonstrating that the insulator-to-half-metal transition is governed by universal geometric percolation of the defect network, extending the percolation framework established for three-dimensional diluted magnetic semiconductors into the 2D vacancy-doped regime. Half-metallicity emerges via a two-step mechanism: crystal-field symmetry breaking () selectively stabilizes the Ti orbital, generating robust local moments (), but spin-polarized transport requires these moments to form a spanning cluster. At critical vacancy concentration , a…
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