Submicrometer focusing of isolated attosecond XUV pulses approaching 10$^{16}$ W/cm$^2$
Kotaro Imasaka, Dianhong Dong, Natsuki Kanda, Bing Xue, Satoru Egawa, Takuya Hosobata, Yutaka Yamagata, Yasuo Nabekawa, and Eiji J. Takahashi

TL;DR
This paper reports the submicrometer focusing of isolated attosecond XUV pulses using a custom ellipsoidal mirror, achieving near diffraction-limited spot sizes and high peak intensities for potential nonlinear optics applications.
Contribution
The authors demonstrate a practical method to focus attosecond XUV pulses to submicrometer scales with high intensities, enabling advances in attosecond nonlinear optics.
Findings
Achieved focal spot sizes down to 0.46 μm × 0.36 μm (FWHM).
Focusing a 1.1-GW IAP source yields 3×10^{15} W/cm^2 peak intensity.
Pathway to reach 10^{16} W/cm^2 by optimizing beamline throughput.
Abstract
We demonstrate submicrometer focusing of isolated attosecond pulses (IAPs) in the extreme ultraviolet (XUV) region using a custom ellipsoidal mirror. The obtained focal spot sizes were verified using knife-edge measurements with a sharp silicon edge, confirming reproducible dimensions down to 0.46 m 0.36 m (FWHM), approaching the diffraction limit. Focusing a 1.1-GW tabletop IAP source yields a peak intensity of 3 10 W/cm, and a realistic pathway toward 10 W/cm is obtained by optimizing the beamline throughput. These results establish a practical route toward attosecond nonlinear optics in both gas and solid phases, driven by intense XUV fields.
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