Anisotropic multiband magnetotransport in LaAg$_2$Ge$_2$ thin films
Mizuki Ohno, Reiley Dorrian, Veronica Show, Joseph Falson

TL;DR
This study reports the growth and detailed magnetotransport characterization of LaAg$_2$Ge$_2$ thin films, revealing anisotropic multiband electronic behavior and magnetoresistance phenomena relevant to layered intermetallic conductors.
Contribution
It demonstrates the epitaxial growth of LaAg$_2$Ge$_2$ thin films and analyzes their anisotropic magnetotransport properties using a two-carrier model.
Findings
Positive magnetoresistance of 22.5% at 9 T
Dominant twofold anisotropy in angle-dependent magnetoresistance
Reproducible dip/peak features at characteristic tilt angles
Abstract
ThCrSi-type intermetallics are layered conductors in which crystallographic anisotropy and multiband electronic states often give rise to characteristic magnetotransport phenomena. Here, we report the molecular-beam epitaxy growth of LaAgGe thin films on MgO(001) and their magnetotransport properties. The Hall effect and magnetoresistance are captured by an effective two-carrier description with a high-mobility electron band, yielding a positive magnetoresistance of 22.5% at 9 T. Angle-dependent magnetoresistance exhibits a dominant twofold anisotropy and additional reproducible dip/peak features at characteristic tilt angles that are nearly independent of field and temperature. These results extend our understanding of the anisotropic electronic transport in thin-film germanides within the ThCrSi family.
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