Anisotropic spin-valley coupling in SiMOS and Si/SiGe quantum dots
N. Tobias Jacobson, Natalie D. Foster, Ryan M. Jock, Martin Rudolph, Andrew M. Mounce, Daniel R. Ward, Malcolm S. Carroll, Dwight R. Luhman

TL;DR
This study measures and models the anisotropic spin-valley coupling in silicon quantum dots, revealing significant differences between SiMOS and Si/SiGe systems and suggesting ways to optimize qubit performance.
Contribution
It provides a detailed physical model of intra- and inter-valley spin-orbit interactions in silicon quantum dots, comparing two common material platforms.
Findings
SiMOS quantum dots exhibit an order of magnitude larger spin-valley coupling than Si/SiGe.
Angular dependence of spin-valley coupling is similar in both systems, with specific magnetic field orientations minimizing coupling.
The model accurately infers SOC physics from experimental data, aiding qubit optimization.
Abstract
While bulk silicon has long been understood to exhibit relatively weak spin-orbit coupling (SOC), confinement of electrons to quantum dots (QDs) at a silicon heterointerface results in significantly larger SOC. This is a concern for electron spin qubit performance, as intravalley and intervalley SOC can significantly perturb the operation of electron spin qubits. While these interactions can be harnessed to drive coherent rotations in a singlet-triplet qubit, coupling to low-lying excited valley states can lead to undesirable spin relaxation when valley splitting is on resonance with the Zeeman energy. In this work, we measure the angular dependence of the interfacial spin-orbit interaction as a function of the direction and magnitude of an applied external magnetic field in SiMOS and Si/SiGe heterostructures, two common material platforms for silicon spin qubits. We construct a…
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