Fully Atomic-Layer-Deposited Vertical Complementary FeRAM with Ultra-High 2Pr > 100 uC/cm2 and High Endurance > 1E10 cycles

TL;DR

This paper introduces a novel all-ALD-grown vertical complementary FeRAM architecture that significantly enhances polarization, endurance, and reliability, enabling scalable high-density memory applications.

Contribution

The work presents a new vertical complementary FeRAM design with all-ALD fabrication, achieving ultra-high polarization and endurance without area overhead.

Findings

Effective differential polarization above 100 μC/cm²

Retains above 90 μC/cm² after 10^10 cycles

Demonstrates robust retention and disturb immunity

Abstract

A limited remanent polarization (Pr) in HfO2-based FeRAM remains a key obstacle to density scaling and reliability, while material and process optimizations offer only incremental improvements. This limitation fundamentally originates from the thickness-constrained switchable polarization and the intrinsic polarization ceiling of HfO2-based ferroelectrics. Here, we propose an all-ALD-grown vertical complementary FeRAM (VCF) architecture, in which the top and bottom stacked FeRAM cells maintain complementary polarization. This complementary dipole configuration converts the readout from a single-layer polarization response into a differential polarization summation, thereby amplifying the effective charge window without increasing the switching field of each individual layer or incurring area overhead. Viewed from top to bottom, an "up-down" polarization pair stores logic '1', whereas a "down-up" pair stores logic '0'. Using a complementary polarization write-read scheme, the VCF achieves an effective differential polarization above 100 uC/cm^2 and retains above 90 uC/cm^2 after 1e10 switching cycles without electrical breakdown. Robust retention (longer than 1e4 s at 85 degC) and strong disturb immunity are demonstrated, with an effective differential polarization above 80 uC/cm^2 under a V/3 scheme after 1e6 disturb pulses. Array-level operation is validated in a 5 x 5 selector-free crosspoint array. The performance enhancement of the VCF arises from the co-optimization of the all-ALD-grown process, device architecture, and operation scheme, enabling high density, a wide memory window, and strong reliability for scalable FeRAM integration.