Low voltage and high-bandwidth thin-film lithium tantalate modulator on a silicon dioxide substrate
Zihan Li, Alexander Kotz, Adrian Schwarzenberger, Christian Koos, Tobias J. Kippenberg

TL;DR
This paper reports the first fabrication of thin-film lithium tantalate electro-optic modulators on fused silica, achieving high bandwidth and low voltage, suitable for next-generation high-speed optical communication.
Contribution
It introduces a novel thin-film lithium tantalate modulator on silica substrate with high bandwidth and low voltage, expanding the material platform for integrated photonics.
Findings
Achieved 64 GHz electro-optic bandwidth with 1.53 V half-wave voltage.
Demonstrated a net data rate of 440.6 Gbps using PAM8 signaling.
Modulator exhibits low bias drift and potential for 100 GHz operation.
Abstract
Modern communication networks demand ever-increasing transmission bandwidth, placing stringent requirements on low-cost, high-performance electro-optic modulators. Substantial advances have been made in integrated photonics employing lithium niobate on insulator. In contrast, photonic integrated circuits based on lithium tantalate -- a material already commercially adopted for wireless filters -- have been developed, offering reduced DC drift, higher optical power handling, and lower birefringence. These advantages enable more complex and dense photonic integrated circuits, and make lithium tantalate a promising material platform for next-generation integrated electro-optic modulators. However, in contrast to the extensively studied thin-film lithium niobate platform, thin-film lithium tantalate modulators have only been explored on silicon substrates. Here, we report the first…
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