Germanium-tin (GeSn) avalanche photodiode with up to 2.7 micro cutoff wavelength for extended SWIR detection
Quang Minh Thai, Rajesh Kumar, Justin Rudie, Xiaoxin Wang, Abdulla Said Ali, Perry C. Grant, Hryhorii Stanchu, Yunsheng Qiu, Steven Akwabli, Chun-Chieh Chang, Jifeng Liu, Baohua Li, Wei Du, and Shui-Qing Yu

TL;DR
This paper reports the development of a GeSn on Si avalanche photodiode with a cutoff wavelength of 2.7 micrometers, enabling extended SWIR detection with high gain and responsivity at various temperatures.
Contribution
It demonstrates a monolithically grown GeSn on Si APD with a thinner Ge buffer, achieving higher Sn content and extended SWIR detection capabilities.
Findings
Cutoff wavelength extended to 2.7 micrometers at 300 K.
High avalanche gain up to 52 at 2 micrometers and 77 K.
Responsivity up to 1.45 AW-1 at 1.55 micrometers.
Abstract
Separate absorption charge multiplication germanium tin on silicon avalanche photodiode offers a viable solution to achieve CMOS compatible, high sensitivity detection technology in SWIR or extended SWIR range, leveraging the excellent k-factor of Si as multiplication layer and SWIR or e-SWIR band absorption of GeSn. However, unlike well-established growth of GeSn on Si with thick Ge buffer in-between to reduce threading dislocation density due to lattice mismatch, GeSn on Si APD design requires relatively thin Ge buffer to limit electric field drop through the background p-doped buffer and efficiently transporting photocarrier from GeSn absorber to Si multiplication layer, therefore making growth of high Sn content APD for e-SWIR coverage very challenging. In this work, we experimentally demonstrate GeSn on Si APD up to 12.7 percent Sn, monolithically grown on Si substrate with…
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