Challenges and mitigation pathways in coating silver nanowire networks with metallic oxides by RF magnetron sputtering

TL;DR

This paper investigates how RF magnetron sputtering affects silver nanowire networks, identifying conditions that cause degradation and proposing strategies to mitigate damage for better device integration.

Contribution

It provides a detailed experimental analysis of sputtering parameters impacting AgNW networks and offers practical guidelines to prevent degradation during coating.

Findings

Degradation depends on sputtering time, oxygen pressure, and plasma power.

Certain buffer layers and optimized conditions reduce network damage.

Guidelines enable safer coating of AgNW networks in multilayer devices.

Abstract

As silver nanowire (AgNW) networks reach increasing technological maturity, research efforts are progressively shifting toward their integration into functional devices. In this context, it is essential to assess how thin film coating processes affect the structural and functional integrity of these transparent conducting networks. Radio Frequency (RF) magnetron sputtering is among the most widely used and industrially scalable deposition techniques, making a detailed understanding of its impact on AgNW networks particularly critical. In this work, we experimentally investigate the degradation of AgNW networks observed under specific RF magnetron sputtering regimes. By varying deposition time, oxygen partial pressure, target material, buffer layers and plasma power, we analyze how sputtering conditions influence the electrical, morphological, and structural properties of the networks. Based on these observations, we identify viable strategies to mitigate or suppress network degradation, thereby enabling safer and more reliable coating protocols. These results provide practical guidelines for the integration of AgNW networks into multilayer device architectures.