Self-Assembled Telecom Color Centers in Silicon and Their Growth Environment
Jacqueline Marb\"ock, Enrique Prado Navarrete, Merve Karaman, Oliver E. Lang, Thomas Fromherz, Maciej O. Liedke, Andreas Wagner, Moritz Brehm, Johannes Aberl

TL;DR
This study explores how vacuum conditions during ultra-low-temperature epitaxial growth affect the formation and optical properties of silicon color centers, advancing their use in quantum photonics.
Contribution
It provides the first detailed analysis of how growth pressure and temperature influence silicon color center self-assembly and optical quality during epitaxial fabrication.
Findings
Growth pressure significantly affects the photoluminescence of SiCCs.
Lower growth pressures suppress background luminescence, improving optical quality.
Substrate temperature influences the self-assembly of specific SiCCs.
Abstract
Artificial atoms based on color centers in silicon (SiCCs) have recently emerged as promising candidates for highly integrable and scalable key components in photonic quantum technology, including telecom single-photon sources and spin memory devices. A novel all-epitaxial fabrication technique for SiCCs, based on ultra-low-temperature (ULT) molecular beam epitaxy (MBE), addresses limitations of conventional fabrication via ion implantation, such as vertical ion straggle and collateral crystal lattice damage. This method solely relies on self-assembly of SiCCs during kinetically-limited growth of (carbon-doped) Si(:C) at ULTs <~350{\deg}C. The latter requires an extraordinary pristine growth environment to prevent unintended defect formation caused by the incorporation of impurities from the background vapor; however, so far, no study has specifically addressed how exactly the vacuum…
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