Epitaxial MgSnN2 on 4H-SiC (0001): An Earth-Abundant Nitride for Green Optoelectronics and Photovoltaics
D. Gogova, D. Tran, V. Stanishev, D. Shafizadeh, C.-L. Hsiao, M. Kim, B. P\'ecz, A. Kov\'acs, K. Frey, A. Sulyok, N. K. Singh, A. Le Febvrier, P. Eklund, and V. Darakchieva

TL;DR
This study demonstrates the epitaxial growth of MgSnN2 on 4H-SiC substrates, revealing its potential as an earth-abundant, tunable-bandgap material suitable for green optoelectronics and photovoltaics.
Contribution
First successful epitaxial growth of MgSnN2 layers on 4H-SiC using magnetron sputtering, with detailed structural and optical characterization.
Findings
MgSnN2 grows epitaxially with wurtzite structure on 4H-SiC
High absorption coefficients (~10^5 cm^-1) in visible spectrum
Photoluminescence at ~2.4 eV indicates potential for green optoelectronics
Abstract
Group II-IV nitrides have recently emerged as a novel class of semiconductors composed of earth-abundant elements. Owing to their tunable bandgaps, comparable to those of III-nitrides, these materials are attractive candidates for replacing expensive Ga-based alloys in photovoltaics and green-gap optoelectronics. In this work, epitaxial growth of MgSnN2 layers on 4H-SiC(0001) substrates by direct current magnetron sputtering is demonstrated. Mg and Sn metal targets have been co-sputtered in nitrogen-containing atmosphere at growth temperatures up to 500 {\deg}C. X-ray diffraction and cross-sectional transmission electron microscopy confirm the MgSnN2 layers grow epitaxially in a wurtzite crystal structure, exhibiting the epitaxial relationships with the substrate: MgSnN2 [0001]//4H-SiC [0001] and MgSnN2 [10-10]//4H-SiC[10-10]. Improved crystalline quality is observed for higher…
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