Oxide-nitride heteroepitaxy for low-loss dielectrics in superconducting quantum circuits
David A. Garcia-Wetten, Mitchell J. Walker, Peter G. Lim, Andr\'e Valli\`eres, Maria G. Jimenez-Guillermo, Miguel A. Alvarado, Dominic P. Goronzy, Anna Grassellino, Jens Koch, Vinayak P. Dravid, Mark C. Hersam, Michael J. Bedzyk

TL;DR
This study demonstrates the integration of crystalline oxide-nitride heterostructures with low microwave loss into superconducting quantum circuits, advancing materials for fault-tolerant quantum computing.
Contribution
It reports the first direct measurement of low-loss epitaxial $ ext{γ}$-Al$_2$O$_3$ dielectric in a heteroepitaxial TiN-based trilayer, confirming its potential for quantum devices.
Findings
Epitaxial $ ext{γ}$-Al$_2$O$_3$ exhibits low two-level system loss ($ ext{δ}_{ ext{TLS}}^0 imes 10^{-5}$)
High-resolution imaging confirms single-crystal quality and minimal defects
Heteroepitaxial oxides on transition metal nitrides are promising for superconducting quantum circuits
Abstract
Superconducting qubits show great promise for the realization of fault-tolerant quantum computing, but lossy, amorphous dielectrics limit current technology. Identifying highly crystalline and stoichiometric dielectrics with intrinsically low microwave loss is therefore a central materials challenge, yet experimentally validated platforms remain scarce. In this work, we integrate a crystalline dielectric into a heteroepitaxial TiN/-AlO/TiN trilayer grown via pulsed laser deposition. Correlative high-resolution imaging, diffraction, and spectroscopy measurements confirm the single-crystal quality and chemical integrity of all layers, with minimal defects and limited anion interdiffusion across the oxide-nitride interfaces. Using microwave lumped-element resonators with parallel-plate capacitors, we report the first direct measurement of the dielectric loss of epitaxial…
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