Non-Fermi liquid behavior in La$_3$Ni$_2$O$_7$ thin films under hydrostatic pressure
Deepak Kumar, Jared Z. Dans, Keenan E. Avers, Ryan Paxson, Ichiro Takeuchi, Johnpierre Paglione

TL;DR
This study demonstrates that La$_3$Ni$_2$O$_7$ thin films exhibit a transition from Fermi liquid to non-Fermi liquid behavior under modest hydrostatic pressure, revealing strong tunability and proximity to a fluctuating ordered state.
Contribution
It reports the epitaxial growth and pressure-dependent transport properties of La$_3$Ni$_2$O$_7$ thin films, highlighting their non-Fermi liquid behavior at relatively low pressures.
Findings
La$_3$Ni$_2$O$_7$ thin films show Fermi liquid behavior on LAO substrates.
Application of modest hydrostatic pressure induces non-Fermi liquid behavior.
Non-Fermi liquid behavior occurs at pressures only 6-8% of those used in single crystals.
Abstract
The discovery of superconductivity in bilayer nickel-oxides has revived an intense effort to understand the potential of high-temperature superconductivity in these materials and their relation to cuprate superconductors. In this work, we investigate the growth and properties of bilayer LaNiO thin films as a function of substrate, oxygen treatment and applied pressure in order to study the evolution of transport properties. We report epitaxial growth of LaNiO thin films on LaAlO (LAO) (001) and SrLaAlO (SLAO) (001) substrates, and the effects of ex-situ annealing in a high pressure furnace under an oxygen-rich environment. Transport measurements show that the LaNiO thin films on LAO(001) exhibit Fermi liquid-like metallic behavior with a slight Kondo-like upturn at low temperatures, which evolves with the application of modest hydrostatic…
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