Strain-released epitaxy of GaN enabled by compliant single-crystalline metal foils
Yaqing Ma, Junwei Cao, Huaze Zhu, Yijian Song, Huicong Chen, Menglin He, Jun Yang, Ping Jiang, Tong Jiang, Han Chen, Xiang Xu, Yuqiao Zheng, Hao Wang, Muhong Wu, Yu Zou, Xiaochuan Chen, Tongbo Wei, Kaihui Liu, Wei Kong

TL;DR
This paper demonstrates a novel strain-released epitaxy method for GaN on compliant single-crystalline copper foils, reducing defects and enabling efficient micro-LED arrays.
Contribution
It introduces a substrate-mediated strain-partitioning regime using compliant single-crystalline metal foils, a new approach in heteroepitaxial growth.
Findings
GaN grown on copper foils is nearly strain-free despite large mismatch.
Elastic deformation of copper screens mismatch-induced stress.
Dense GaN micro-LED arrays with improved electrical and thermal performance.
Abstract
Heteroepitaxy conventionally relies on rigid crystalline substrates, implicitly assuming that lattice and thermal mismatch must be accommodated within the epitaxial layer, leading to residual strain and defects that worsen with increasing substrate size. Here we demonstrate a substrate-mediated strain-partitioning regime in which lattice and thermal mismatch are preferentially partitioned into the substrate rather than stored in the epitaxial layer. We report the epitaxial growth of single-crystalline GaN on mechanically compliant yet crystallographically ordered single-crystalline copper foils. Atomic-resolution microscopy, geometric phase analysis and density functional theory reveal that mismatch-induced stress is primarily screened by elastic deformation of the Cu lattice, accompanied by localized interfacial slip confined to a few atomic layers, leaving the AlN and GaN epilayers…
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