Antiferromagnetic stripe phase and large-gap insulating ground state of the correlated $\sqrt{3}\times\sqrt{3}$~R30$^{\circ}$-Sn/Si(111) single atomic layer
Mohammadmehdi Torkzadeh, Mattia Iannetti, Mathieu Liz\'ee, Amitayhush Thakur, Maris Herv\'e, Francois Debontridder, Pascal David, Michele Casula, Gianni Profeta, Tristan Cren, Matteo Calandra, Cesare Tresca, Christophe Brun

TL;DR
This study uncovers a large-gap insulating ground state with antiferromagnetic stripe order in a Sn/Si(111) monolayer, combining experimental STM/STS and first-principles calculations to reveal substrate-driven correlations.
Contribution
It provides the first direct experimental evidence of a large-gap insulator with stripe-like antiferromagnetic order in Sn/Si(111), emphasizing substrate effects on correlated phases.
Findings
Large insulating gap (~440 meV) observed at 4K.
Direct evidence of stripe-like antiferromagnetic order.
Substrate stabilizes the phase through nonlocal interactions.
Abstract
The one-third monolayer Sn layer on Si(111) has long been considered a benchmark system for exploring two-dimensional Mott physics, owing to its narrow bandwidth and sizable on-site Coulomb repulsion. Previous experiments suggested the emergence of a low-temperature Mott insulating phase with an energy gap of only a few tens of meV, while theory predicted a possible antiferromagnetic ordering that remained experimentally elusive. Here, by combining low-temperature scanning tunneling microscopy/spectroscopy with first-principles calculations, we reveal that the ~R30-Sn/Si(111) surface undergoes a transition below 30K into a robust insulating state characterized by a remarkably large gap of about 440 120 meV at 4K, five to ten times larger than previously reported. Quasiparticle interference imaging uncovers a well-defined…
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