Universal effect of ammonia pressure on synthesis of colloidal metal nitrides in molten salts
Ruiming Lin, Vikash Khokhar, Ningxin Jiang, Wooje Cho, Zirui Zhou, Di Wang, Justin C. Ondry, Zehan Mi, James Cassidy, Alex M. Hinkle, John S. Anderson, Richard D. Schaller, De-en Jiang, Dmitri V. Talapin

TL;DR
This paper presents a universal method for synthesizing colloidal metal nitride nanocrystals using ammonia pressure in molten salts, enabling the production of various technologically important nitrides.
Contribution
The authors introduce a novel solution-based synthesis approach for colloidal metal nitrides leveraging ammonia pressure in molten salts, expanding material accessibility.
Findings
Successful synthesis of multiple colloidal metal nitrides including TiN, VN, GaN, NbN, Mo2N, Ta3N5, W2N.
Demonstration of ternary Ti1-xVxN nanocrystals.
Method enables solution processing of important nitride materials.
Abstract
Metal nitrides represent a large class of materials with extensive applications in optoelectronics, energy, and healthcare technologies. For example, GaN and related nitride semiconductors are key materials for solid-state lighting and high-power electronics, TiN and other early transition metal nitrides (TMNs) are widely used in wear-resistant alloys, tool coatings, catalysts and medical implants. Strong metal-nitrogen bonds grant nitrides structural rigidity as well as chemical and thermal stability. However, the covalency of metal-nitrogen bonds necessitates high temperatures to synthesize crystalline metal nitrides. Common synthetic routes include high-temperature solid-state nitridation, crystal growth in supercritical ammonia, molecular-beam epitaxy (MBE), reactive sputtering, and chemical vapor deposition (CVD). The solution synthesis of colloidal nitride nanocrystals (NCs) is…
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