Pre-Patterned Superconducting Contacts for Clean Superconductor-Topological Material Interfaces Enabling Long-Range Josephson Coupling
Yong-Bin Choi, Chang-Won Choi, Luke Holtzman, Hoil Kim, Seongwoo Kang, Kenji Watanabe, Takashi Taniguchi, James Hone, Jun Sung Kim, Si-Young Choi, Gil-Ho Lee

TL;DR
This paper presents a novel pre-patterned superconducting contact architecture that enhances interface quality and enables long-range Josephson coupling in topological materials, improving device reproducibility and performance.
Contribution
Introduction of a pre-patterned bottom-contact design for superconductor-topological material interfaces that avoids damage from conventional fabrication methods.
Findings
Larger critical current times normal resistance (I_c R_N) in Josephson junctions.
Longer-ranged Josephson coupling observed.
Atomically abrupt and chemically well-separated interfaces confirmed by STEM/EDS.
Abstract
Phase-coherent superconducting proximity in topological materials requires clean superconductor-topological material (SC-TM) interfaces, yet conventional top-contact fabrication often degrades them through oxidation, polymer residue, and process-induced disorder. Here we introduce a pre-patterned superconducting bottom-contact architecture in which MoRe/Au electrodes are defined before van der Waals crystal transfer, thereby avoiding on-flake lithography after transfer. In WTe2- and Bi1.5Sb0.5Te1.7Se1.3-based Josephson junctions, this architecture yields systematically larger I_c R_N and longer-ranged coupling than conventional top contacts. Cross-sectional STEM/EDS reveals atomically abrupt, chemically well-separated interfaces. These results establish pre-patterned SC-TM contacts as a practical route to reproducible, micrometer-scale Josephson platforms in van der Waals topological…
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Taxonomy
TopicsTopological Materials and Phenomena · Chemical and Physical Properties of Materials · Graphene research and applications
