Spontaneous Polarization Suppression of Exciton-Exciton Annihilation in 3R-Stacked MoS$_2$ Bilayers
Tae Gwan Park, Xufan Li, Kyungnam Kang, David B. Geohegan, Christopher M. Rouleau, Alexander A. Puretzky, and Kai Xiao

TL;DR
This study demonstrates that spontaneous polarization in 3R-stacked MoS₂ bilayers suppresses exciton-exciton annihilation, enabling higher exciton densities for optoelectronic applications by reducing nonlinear excitonic losses.
Contribution
The paper reveals that spontaneous polarization intrinsic to 3R-stacked MoS₂ bilayers suppresses EEA through dipole-dipole repulsion, a novel mechanism for controlling excitonic interactions.
Findings
EEA rate in 3R bilayers is 18.2 times smaller than in monolayers.
Reduced EEA rate in 3R bilayers compared to 2H bilayers.
Dipole-dipole repulsive potential explains the suppressed EEA rate.
Abstract
Rapid exciton-exciton annihilation (EEA) in two-dimensional semiconductors limits access to high-density excitonic regimes essential for efficient optoelectronic operation under strong excitation. Here, we show that EEA is suppressed by repulsive dipole-dipole interactions between interlayer excitons polarized by the spontaneous polarization intrinsic to rhombohedral (3R)-stacked MoS bilayers. Using ultrafast pump-probe spectroscopy, we measure an EEA rate of cm s in 3R bilayers, which is approximately 18.2-fold smaller than that in monolayers and 2.9-fold smaller than that in nonpolar 2H bilayers. Despite the higher exciton diffusivity recently reported for 3R relative to 2H bilayers, the reduced EEA rate in 3R indicates a rate-limited regime governed by the close-encounter annihilation probability rather than diffusion. A…
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Taxonomy
Topics2D Materials and Applications · Strong Light-Matter Interactions · Organic and Molecular Conductors Research
