Quantum-limited traveling-wave parametric amplifier based on DUV lithography-defined planar structures
Hao Li, Marco Scigliuzzo, Evgenii Guzovskii, Seog-Tae Han, Kyungho Han, Tobias J. Kippenberg

TL;DR
This paper presents a scalable, low-loss traveling-wave parametric amplifier fabricated with DUV lithography, achieving broadband gain, near-quantum-limited noise, and compact design, advancing large-scale quantum computing hardware.
Contribution
It introduces a hybrid fabrication scheme combining DUV lithography with electron-beam-patterned Josephson junctions for scalable TWPA manufacturing.
Findings
Broadband gain from 3 to 11 GHz
Near-quantum-limited noise performance
Compact footprint with high uniformity
Abstract
The relentless scaling of classical microelectronics has been enabled by the precision and reproducibility of deep-ultraviolet (DUV) optical lithography. Implementing large-scale superconducting quantum processors will require cryogenic microwave components that follow a similarly scalable fabrication path. This need is particularly acute for high circuit-density devices such as traveling-wave parametric amplifiers (TWPAs), where recent implementations have demonstrated high gain, broad bandwidth, high saturation power, and near-quantum-limited noise, but trade-offs between footprint, insertion loss, and scalable integration remain. Here, we demonstrate a four-wave-mixing TWPA fabricated via a hybrid scheme that combines DUV-defined planar circuit elements with electron-beam-patterned Josephson junctions, constituting a first step toward fully scalable manufacturing. The device combines…
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Taxonomy
TopicsMechanical and Optical Resonators · Quantum Information and Cryptography · Physics of Superconductivity and Magnetism
