Epitaxy of strained, nuclear-spin free $^{76}$Ge quantum wells from solid source materials
Maximilian Oezkent, Chen-Hsun Lu, Lucas Becker, Sebastian Koelling, Robert H. Blick, Elo\"ise Rahier, Stefan Sch\"onert, Nikolay Abrosimov, Thilo Remmele, Torsten Boeck, Georg Schwalb, Oussama Moutanabbir, Martin Albrecht, Carsten Richter, Jens Martin, Kevin-P. Gradwohl

TL;DR
This paper demonstrates the epitaxial growth of high-quality, strain-relaxed $^{76}$Ge quantum wells with ultra-thin interfaces and low nuclear-spin impurities, enabling advanced solid-state quantum information processing.
Contribution
It introduces a novel method for fabricating nuclear-spin free $^{76}$Ge quantum wells with record interface quality and low impurity levels, advancing quantum device scalability.
Findings
Achieved a quantum well interface width of 0.3 nm.
Demonstrated electron mobilities of 6.1×10^4 cm^2V^{-1}s^{-1} at 15 mK.
Low impurity concentrations below 10^{19} cm^{-3}.
Abstract
Germanium quantum well heterostructures have rapidly emerged as a leading platform for solid-state quantum information processing; however, material quality limits scalability, and higher structural quality, higher purity, as well as zero nuclear spin, are required. Here, we address these problems by employing the heaviest of Ge isotopes, by evaporating high-purity Ge radiation detector material, as utilized in fundamental neutrino particle physics experiments, to fabricate Ge/SiGe quantum wells for quantum applications and explore the respective challenges. Specifically, we demonstrate improved results on strain-relaxed virtual SiGe substrates, forward graded from Si, with a dislocation density below 3.710 cm, explore nuclear spin-free solid-source molecular beam epitaxy, and demonstrate first quantum transport in…
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Taxonomy
TopicsQuantum and electron transport phenomena · Advanced Materials Characterization Techniques · Semiconductor Quantum Structures and Devices
