Epitaxial Growth and Electronic Properties of QuasiFreeStanding Rhombohedral WSe2 Bilayers on Cubic W110
Niels Chapuis, Meryem Bouaziz, Eva Desgue, Iann Gerber, Fran\c{c}ois Bertarn, Pierre Legagneux, Fabrice Oehler, Julien Chaste, Abdelkarim Ouerghi

TL;DR
This paper reports the epitaxial growth of rhombohedral WSe2 bilayers on W(110) substrates, revealing their electronic structure and potential for ferroelectric applications in two-dimensional materials.
Contribution
It demonstrates a novel method for growing quasi free-standing 3R-WSe2 bilayers on cubic substrates using molecular beam epitaxy with selenium passivation.
Findings
Confirmed 3R stacking via Raman and ARPES
Identified indirect bandgap and spin-orbit splitting
Measured hole effective masses at K point
Abstract
Rhombohedral-stacked transition metal dichalcogenides (TMDs) break inversion symmetry between adjacent layers, giving rise to an intrinsic out-of-plane ferroelectric polarization.Controlling the formation of this stacking polytype is therefore essential for harnessing ferroelectric effects in two-dimensional materials. In this work, we demonstrate the epitaxial growth of rhombohedral bilayer tungsten diselenide (3R-WSe2) on a cubic W(110) single crystal by molecular beam epitaxy. We show that selenium passivation of the substrate is key to enable a quasi van der Waals epitaxy effectively suppressing strong interfacial bonding and promoting the growth of quasi free standing bilayer films. The 3R stacking order is confirmed through a combination of Raman spectroscopy and high-resolution angle-resolved photoemission spectroscopy (ARPES), supported by density functional theory (DFT)…
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Taxonomy
Topics2D Materials and Applications · Graphene research and applications · Topological Materials and Phenomena
