Accessibility of doping ranges of semiconductors by terahertz spectroscopy
Joshua Hennig, Jens Klier, Stefan Duran, Mirco Kutas, Joachim Jonuscheit, Georg von Freymann, Daniel Molter

TL;DR
This paper introduces a sensitivity metric for reflection terahertz spectroscopy to determine the doping ranges of semiconductors that can be measured contact-free, validated through simulations and experimental data.
Contribution
It develops a quantitative sensitivity metric based on numerical simulations to assess the doping measurement capabilities of terahertz spectroscopy for various semiconductor materials.
Findings
Accessible doping range is approximately 10^15 to 10^20 cm^-3.
Sensitivity depends on material, doping type, and sample thickness.
Future system improvements could extend measurement capabilities, as shown by simulations.
Abstract
While established semiconductor measurement techniques such as four-point probe or capacitance-voltage measurements require a physical contact to the material, terahertz spectroscopy is completely contact-free. Its capability to measure the doping of semiconductors is well known, yet the exact doping ranges that are accessible to terahertz spectroscopy are not obvious. Therefore, we introduce a sensitivity metric to clarify whether a semiconductor sample can be characterized in principle by reflection terahertz time-domain spectroscopy. This quantity takes into account the semiconductor material with a certain layer thickness, doping type, and doping level and is based on numerical simulations. In this work, we calculate this sensitivity value for relevant semiconductor materials (SiC, Si, GaN) in realistic layer stacks with up to three layers. It is used to create meaningful heat maps…
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