Pushing the Limits of Inverse Lithography with Generative Reinforcement Learning
Haoyu Yang, Haoxing Ren

TL;DR
This paper introduces a generative reinforcement learning approach for inverse lithography, significantly improving mask quality and computational efficiency by learning to propose better initializations and guiding the optimization process.
Contribution
It reformulates mask synthesis as conditional sampling with a hybrid training method, enabling better initializations and faster convergence in ILT.
Findings
Reduces EPE violations under 3nm tolerance
Doubles throughput compared to numerical ILT baseline
Achieves over 20% EPE improvement on ICCAD13 cases
Abstract
Inverse lithography (ILT) is critical for modern semiconductor manufacturing but suffers from highly non-convex objectives that often trap optimization in poor local minima. Generative AI has been explored to warm-start ILT, yet most approaches train deterministic image-to-image translators to mimic sub-optimal datasets, providing limited guidance for escaping non-convex traps during refinement. We reformulate mask synthesis as conditional sampling: a generator learns a distribution over masks conditioned on the design and proposes multiple candidates. The generator is first pretrained with WGAN plus a reconstruction loss, then fine-tuned using Group Relative Policy Optimization (GRPO) with an ILT-guided imitation loss. At inference, we sample a small batch of masks, run fast batched ILT refinement, evaluate lithography metrics (e.g., EPE, process window), and select the best candidate.…
Peer Reviews
No public reviews on file for this paper yet. If you reviewed it on a platform where reviews are public (OpenReview, ICLR, NeurIPS, ICML), you can paste yours below so the community can read it here.
Videos
No videos yet. Explain this paper in a talk, walkthrough, or lecture? Add one.
Taxonomy
TopicsAdvancements in Photolithography Techniques · VLSI and FPGA Design Techniques · Physical Unclonable Functions (PUFs) and Hardware Security
